Characterisation of engineered defects in extreme ultraviolet mirror substrates using lab-scale extreme ultraviolet reflection ptychography
Haoyan Lu, Michal Odstrčil, Charles Pooley, Jan Biller, Mikheil Mebonia, Guanze He, Matthew Praeger, Larissa Juschkin, Jeremy G. Frey, W.S. Brocklesby
Topics & Concepts
Extreme ultraviolet lithographyExtreme ultravioletOpticsPtychographyCoherent diffraction imagingMaterials scienceMicroscopyReflection (computer programming)Phase retrievalOptoelectronicsPhysicsLaserDiffractionFourier transformComputer scienceQuantum mechanicsProgramming languageAdvanced X-ray Imaging TechniquesAdvanced Electron Microscopy Techniques and ApplicationsLaser-Plasma Interactions and Diagnostics