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Atomic and close-to-atomic scale polishing of Lu2O3 by plasma-assisted etching

Peng Lyu, Min Lai, Ze Liu, Fengzhou Fang

2023International Journal of Mechanical Sciences14 citationsDOI

Topics & Concepts

PolishingMaterials scienceChemical-mechanical planarizationEtching (microfabrication)LutetiumOxideSurface roughnessSlurrySurface finishPlasmaPlasma etchingSurface modificationReactive-ion etchingMetallurgyComposite materialChemical engineeringYttriumPhysicsQuantum mechanicsEngineeringLayer (electronics)Semiconductor materials and devicesElectronic and Structural Properties of OxidesDiamond and Carbon-based Materials Research
Atomic and close-to-atomic scale polishing of Lu2O3 by plasma-assisted etching | Litcius