Sputtered Cu-doped NiO thin films as an efficient electrocatalyst for methanol oxidation
Mohamed Sh. Abdel-wahab, Hadeer K. El Emam, Waleed M. A. El Rouby
Abstract
Ag/AgCl. All deposited thin films of different thicknesses exhibited high stability at 0.6 V in 1 M methanol. This will open the window toward using physical deposition techniques for optimizing the electrocatalytic activity of different catalysts for electrocatalytic applications.
Topics & Concepts
Non-blocking I/OMaterials scienceThin filmCrystallinityTin oxideChemical engineeringElectrocatalystMethanolDopingSubstrate (aquarium)Analytical Chemistry (journal)NanotechnologyCatalysisElectrochemistryElectrodeComposite materialOptoelectronicsChemistryEngineeringPhysical chemistryBiochemistryOceanographyOrganic chemistryGeologyChromatographyElectrocatalysts for Energy ConversionCatalytic Processes in Materials ScienceCopper-based nanomaterials and applications