Litcius/Paper detail

Nitrogen‐doping graphene at ambient conditions with N<sub>2</sub>‐DBD‐plasma and the role of neutral species

Alina Begley, Giovanni Luca Bartolomeo, Daniel F. Abbott, Victor Mougel, Renato Zenobi

2023Plasma Processes and Polymers11 citationsDOIOpen Access PDF

Abstract

Abstract We doped nitrogen into monolayer graphene using reactive nitrogen species from a dielectric barrier discharge (DBD). After 30 s of treatment, the graphene monolayer had a moderate degree of damage ( I D / I G = 1.2) and an increase in the N‐atom (pyrrolic) and O‐atom (mixed) content. During long treatment times (20 min), the treated area increased radially and the graphene was destroyed. Overall, the N‐atom content increased with increasing operating voltage of the DBD source. When the graphene was treated with only neutral reactive nitrogen species, the N‐atom content and type remained unchanged. Therefore, we hypothesize that the primary reactive species resulting in pyrrolic N‐doping from the DBD are neutrals such as N( 4 S) and possibly N( 2 P).

Topics & Concepts

GrapheneDielectric barrier dischargeNitrogenMonolayerNitrogen atomAtom (system on chip)DopingMaterials scienceAnalytical Chemistry (journal)PlasmaDielectricChemistryNanotechnologyOrganic chemistryOptoelectronicsPhysicsComputer scienceEmbedded systemQuantum mechanicsGroup (periodic table)Graphene research and applicationsDiamond and Carbon-based Materials ResearchRadiation Effects in Electronics