Reliable high work-function molybdenum dioxide synthesis <i>via</i> template-effect-utilizing atomic layer deposition for next-generation electrode applications
Ye Won Kim, Aejin Lee, Dong Hee Han, Dae Cheol Lee, Ji Hyeon Hwang, Youngjin Kim, Songyi Moon, Taewon Youn, Minyung Lee, Woojin Jeon
Abstract
An atomic layer deposition (ALD) method for coating metastable MoO 2 thin films onto substrates was investigated. It is the first reported growth of metastable phased thin films based on chemical reaction-mediated thin film deposition processes, such as chemical vapor deposition or ALD.
Topics & Concepts
Atomic layer depositionMaterials scienceThin filmMolybdenumMetastabilityDeposition (geology)ElectrodeLayer (electronics)Chemical vapor depositionWork functionChemical engineeringCombustion chemical vapor depositionNanotechnologyCoatingOptoelectronicsCarbon filmMetallurgyOrganic chemistryChemistryPhysical chemistryBiologySedimentPaleontologyEngineeringSemiconductor materials and devicesElectronic and Structural Properties of OxidesTransition Metal Oxide Nanomaterials