High Current and Linearity AlGaN/GaN/-Graded-AlGaN:Si-doped/GaN Heterostructure for Low Voltage Power Amplifier Application
Qian Yu, Chunzhou Shi, Ling Yang, Hao Lu, Meng Zhang, Mei Wu, Bin Hou, Fuchun Jia, Fei Guo, Xiaohua Ma, Yue Hao
Abstract
In this letter, the AlGaN/GaN/graded-AlGaN:Si-doped/GaN double channel (GDC-SI) high electronic mobility transistors (HEMTs) with high saturation current density and linearity have been reported for low voltage applications. Compared with the standard AlGaN/GaN/AlGaN/GaN double channel GaN (SDC) HEMTs, the GDC-SI HEMTs exhibited the higher saturation current, the broader and flatter transconductance profile, the lower transconductance ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${g}_{\text {m}}{)}$ </tex-math></inline-formula> derivatives, and lower on-resistance ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {on}}{)}$ </tex-math></inline-formula> . Due to the Si-doped graded bottom barrier present in GDC-SI HEMTs, the profile of current gain cutoff frequency ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${f}_{\text {T}}{)}$ </tex-math></inline-formula> and the maximum oscillation frequency ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${f}_{\text {max}}{)}$ </tex-math></inline-formula> were flatter with the bias voltage increased. The output power density of 0.75 W/mm and power added efficiency (PAE) of 58% were achieved for GDC-SI HEMTs, at the drain voltage of 7 V and the test frequency of 3.6GHz. The output third-order intercept point (OIP3) of 39.3 dBm and saturation current density of 1909 mA/mm are achieved, which are the state-of-the-art saturation current and OIP3 in the double-channel GaN HEMTs.