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Highly area-selective atomic layer deposition of device-quality Hf1-xZrxO2 thin films through catalytic local activation

Hyo‐Bae Kim, Jeong‐Min Lee, Dougyong Sung, Ji‐Hoon Ahn, Woo‐Hee Kim, Woo‐Hee Kim

2024Chemical Engineering Journal14 citationsDOI

Topics & Concepts

Atomic layer depositionCatalysisLayer (electronics)Deposition (geology)Materials scienceThin filmChemical engineeringAtomic layer epitaxyNanotechnologyChemistryOrganic chemistryGeologySedimentEngineeringPaleontologyFerroelectric and Negative Capacitance DevicesSemiconductor materials and devicesElectronic and Structural Properties of Oxides
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