Incorporation of Zn ions on high dielectric HfO2 thin films by spray pyrolysis and fabrication of Al/Zn@HfO2/n-Si Schottky barrier diodes
P. Harishsenthil, J. Chandrasekaran, R. Marnadu, V. Balasubramani
Topics & Concepts
Materials scienceX-ray photoelectron spectroscopyAnalytical Chemistry (journal)Thin filmBand gapDielectricMesoporous materialThermionic emissionSchottky diodeSchottky barrierGrain sizeDiodeNanotechnologyOptoelectronicsChemical engineeringChemistryComposite materialBiochemistryChromatographyEngineeringCatalysisElectronQuantum mechanicsPhysicsSemiconductor materials and devicesSemiconductor materials and interfacesFerroelectric and Negative Capacitance Devices