Large-area patterning of full-color quantum dot arrays beyond 1000 pixels per inch by selective electrophoretic deposition
Jinyang Zhao, Lixuan Chen, Dongze Li, Zhiqing Shi, Pai Liu, Zhenlei Yao, Hongcheng Yang, Taoyu Zou, Bin Zhao, Xin Zhang, Hang Zhou, Yixing Yang, Weiran Cao, Xiaolin Yan, Shengdong Zhang, Xiao Wei Sun
Abstract
Colloidal quantum dot (QD) emitters show great promise in the development of next-generation displays. Although various solution-processed techniques have been developed for nanomaterials, high-resolution and uniform patterning technology amicable to manufacturing is still missing. Here, we present large-area, high-resolution, full-color QD patterning utilizing a selective electrophoretic deposition (SEPD) technique. This technique utilizes photolithography combined with SEPD to achieve uniform and fast fabrication, low-cost QD patterning in large-area beyond 1,000 pixels-per-inch. The QD patterns only deposited on selective electrodes with precisely controlled thickness in a large range, which could cater for various optoelectronic devices. The adjustable surface morphology, packing density and refractive index of QD films enable higher efficiency compared to conventional solution-processed methods. We further demonstrate the versatility of our approach to integrate various QDs into large-area arrays of full-color emitting pixels and QLEDs with good performance. The results suggest a manufacture-viable technology for commercialization of QD-based displays.