A new metallization method of modified tannic acid photoresist patterning
Zicheng Tang, Xubin Guo, Haihua Wang, Huan Chen, Wenbing Kang
Abstract
A new process of in situ Ag fine pattern formation by direct pattern transfer of a modified tannic acid photoresist and in situ electroless plating in an Ag ion solution was reported.
Topics & Concepts
Tannic acidPhotoresistIn situMaterials sciencePlating (geology)Chemical engineeringNanotechnologyChemistryOrganic chemistryLayer (electronics)GeologyEngineeringGeophysicsNanofabrication and Lithography TechniquesNanomaterials and Printing TechnologiesSurface Modification and Superhydrophobicity