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Numerical modeling of SiC by low-pressure chemical vapor deposition from methyltrichlorosilane

Kang Guan, Yong Gao, Qingfeng Zeng, Xingang Luan, Yi Zhang, Laifei Cheng, Jianqing Wu, Zhenya Lu

2020Chinese Journal of Chemical Engineering17 citationsDOI

Topics & Concepts

Chemical vapor depositionChemical vapor infiltrationStoichiometryDeposition (geology)Materials scienceKineticsAnalytical Chemistry (journal)CeramicChemical engineeringChemistryComposite materialPhysical chemistryNanotechnologyEnvironmental chemistryPaleontologyPhysicsQuantum mechanicsBiologyEngineeringSedimentAdvanced ceramic materials synthesisThermal properties of materialsMetal and Thin Film Mechanics
Numerical modeling of SiC by low-pressure chemical vapor deposition from methyltrichlorosilane | Litcius