Growth of Monolayer and Multilayer MoS<sub>2</sub> Films by Selection of Growth Mode: Two Pathways via Chemisorption and Physisorption of an Inorganic Molecular Precursor
Chaehyeon Ahn, Young-Hee Park, Seung-Hyun Shin, Jong‐Guk Ahn, Intek Song, Youngjoon An, Jaehoon Jung, Chung Soo Kim, Jee Hyeon Kim, Jiwon Bang, Daehyun Kim, Jaeyoon Baik, Hyunseob Lim
Abstract
We report facile growth methods for high-quality monolayer and multilayer MoS2 films using MoOCl4 as the vapor-phase molecular Mo precursor. Compared to the conventional covalent solid-type Mo precursors, the growth pressure of MoOCl4 can be precisely controlled. This enables the selection of growth mode by adjusting growth pressure, which facilitates the control of the growth behavior as the growth termination at a monolayer or as the continuous growth to a multilayer. In addition, the use of carbon-free precursors eliminates concerns about carbon contamination in the produced MoS2 films. Systematic studies for unveiling the growth mechanism proved two growth modes, which are predominantly the physisorption and chemisorption of MoOCl4. Consequently, the thickness of MoS2 can be controlled by our method as the application demands.