Litcius/Paper detail

A nanoclustered ceria abrasives with low crystallinity and high Ce3+/Ce4+ ratio for scratch reduction and high oxide removal rates in the chemical mechanical planarization

Na‐Yeon Kim, Goeun Kim, Hanna Sun, Uiseok Hwang, Junyoung Kim, Donggeon Kwak, Inkyung Park, Taesung Kim, Jonghwan Suhr, Jae‐Do Nam

2022Journal of Materials Science50 citationsDOI

Topics & Concepts

CrystallinityMaterials scienceCrystalliteCerium oxideOxideChemical engineeringNanoparticleCeriumParticle sizeNanotechnologyComposite materialMetallurgyEngineeringAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced materials and composites
A nanoclustered ceria abrasives with low crystallinity and high Ce3+/Ce4+ ratio for scratch reduction and high oxide removal rates in the chemical mechanical planarization | Litcius