Litcius/Paper detail

Microscopic and data-driven modeling and operation of thermal atomic layer etching of aluminum oxide thin films

Sungil Yun, Matthew Tom, Junwei Luo, Gerassimos Orkoulas, Panagiotis D. Christofides

2021Process Safety and Environmental Protection21 citationsDOIOpen Access PDF

Topics & Concepts

Atomic layer depositionEtching (microfabrication)Kinetic Monte CarloMaterials scienceThermalThin filmOxideLayer (electronics)NanotechnologyMonte Carlo methodComputer scienceThermodynamicsMetallurgyPhysicsMathematicsStatisticsSemiconductor materials and devicesPlasma Diagnostics and ApplicationsCopper Interconnects and Reliability
Microscopic and data-driven modeling and operation of thermal atomic layer etching of aluminum oxide thin films | Litcius