Atmospheric pressure metal-organic chemical vapor deposition (AP-MOCVD) growth of undoped and aluminium-doped ZnO thin film using hot wall reactor
Abdelkader Nebatti Ech‐Chergui, Christian Pflitsch, Burak Atakan
Topics & Concepts
Materials scienceChemical vapor depositionMetalorganic vapour phase epitaxyBorosilicate glassZincThin filmScanning electron microscopeAnalytical Chemistry (journal)DopingAtmospheric pressureAluminiumInorganic chemistryMetallurgyNanotechnologyComposite materialOptoelectronicsLayer (electronics)ChemistryOrganic chemistryEpitaxyOceanographyGeologyZnO doping and propertiesCopper-based nanomaterials and applicationsGas Sensing Nanomaterials and Sensors