Nucleation and lateral growth kinetics of the NiSi phase at the epitaxial θ-Ni2Si/Si interface
M. El Kousseifi, K. Hoummada, Federico Panciera, C. Lavoie, D. Mangelinck
Topics & Concepts
NucleationAtom probeMaterials scienceIsothermal processKineticsPhase (matter)Annealing (glass)EpitaxyCrystallographyThermodynamicsAnalytical Chemistry (journal)MicrostructureMetallurgyNanotechnologyLayer (electronics)ChemistryPhysicsChromatographyQuantum mechanicsOrganic chemistrySemiconductor materials and interfacesAdvanced Materials Characterization TechniquesIntegrated Circuits and Semiconductor Failure Analysis