Meso-silica/Erbium-doped ceria binary particles as functionalized abrasives for photochemical mechanical polishing (PCMP)
Ailian Chen, Yuhan Duan, Zhaoyu Mu, Wenjie Cai, Yang Chen
Topics & Concepts
Materials scienceChemical engineeringPhotocatalysisHigh-resolution transmission electron microscopyX-ray photoelectron spectroscopyRaman spectroscopyOxidePolishingAnataseNanoparticleDopingComposite materialNanotechnologyMetallurgyCatalysisOrganic chemistryChemistryOptoelectronicsEngineeringTransmission electron microscopyPhysicsOpticsAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchForce Microscopy Techniques and Applications