Light-induced electrostatic lithography: selective discharge of electrets by utilizing photothermal conversion of Ti<sub>3</sub>C<sub>2</sub>T<sub>x</sub> MXene
Hui Ma, Haoge Cheng, Xinlei Ma, Sen Wang, Zhuqing Zhou, Yuqiao Chai, Ruoqi Chen, Xinyue Zhang, Yonglin He, Yapei Wang, Yan Li, Xusheng Wang, Rui Li, Ning Ma, Mianqi Xue
Abstract
A novel light-induced electrostatic lithography is developed by combining <italic>in situ</italic> photothermal conversion with selective thermally stimulated discharging.
Topics & Concepts
LithographyPhotothermal therapyMaterials scienceElectretX-ray lithographyOptoelectronicsElectrostaticsPhotolithographyOpticsNanotechnologyResistChemistryPhysicsLayer (electronics)Physical chemistryComposite materialMXene and MAX Phase MaterialsAdvanced Memory and Neural ComputingAdvanced Sensor and Energy Harvesting Materials