Mo/Si lamellar multilayer gratings with high efficiency and enhanced resolution for the x-ray region of 1000–1700eV
Yufei Feng, Qiushi Huang, Yeqi Zhuang, Andréy Sokolov, Stephanie Lemke, Runze Qi, Zhong Zhang, Zhanshan Wang
Abstract
The d-spacing of the multilayer lamellar grating was theoretically optimized to improve the energy resolution and maintain a high efficiency. Based on the study of the growth behavior of Mo/Si multilayer on the lamellar grating under different sputtering pressures, Ar gas pressure of 1 mTorr was selected, which can fabricate the multilayer with lower roughness and a good replication of the groove shape. An absolute diffraction efficiency of 25.6% and a Cff factor of 1.79 were achieved for the -1st order of the Mo/Si lamellar multilayer grating at an energy of 1700 eV.
Topics & Concepts
Lamellar structureMaterials scienceGratingOpticsDiffraction efficiencyDiffraction gratingDiffractionSputteringGroove (engineering)OptoelectronicsSurface finishResolution (logic)Surface roughnessThin filmComposite materialNanotechnologyMetallurgyComputer scienceArtificial intelligencePhysicsIon-surface interactions and analysisAdvanced Chemical Physics StudiesHigh-pressure geophysics and materials