Interplay Between Charge Trapping and Polarization Switching in BEOL-Compatible Bilayer Ferroelectric Tunnel Junctions
Riccardo Fontanini, Justine Barbot, Mattia Segatto, Suzanne Lancaster, Quang T. Duong, F. Driussi, L. Grenouillet, François Triozon, J. Coignus, Thomas Mikolajick, Stefan Slesazeck, David Esseni
Abstract
We here report a joint experimental and theoretical analysis of polarization switching in ferroelectric tunnel junctions. Our results show that the injection and trapping of charge into the ferroelectric-dielectric stack has a large influence on the polarization switching. Our results are relevant to the physical understanding and to the design of the devices, and for both memory and memristor applications.
Topics & Concepts
FerroelectricityTrappingPolarization (electrochemistry)Materials scienceNon-volatile memoryDielectricMemristorBilayerOptoelectronicsTunnel junctionFerroelectric capacitorStack (abstract data type)Condensed matter physicsElectronic engineeringQuantum tunnellingPhysicsMembraneComputer scienceChemistryEngineeringPhysical chemistryBiologyProgramming languageBiochemistryEcologyAdvanced Memory and Neural ComputingFerroelectric and Negative Capacitance DevicesSemiconductor materials and devices