Effect of nitrogen plasma on the mechanical and electrical properties of plasma-enhanced atomic layer deposited TiN films
Jeong Woo Shin, Jaehyeong Lee, Keunhoi Kim, Chansong Kwon, Young Bin Park, Heesung Park, Kwanlae Kim, Hyo Suk Ahn, Dongha Shim, Jihwan An
Topics & Concepts
TinMaterials scienceAtomic layer depositionTitanium nitridePlasmaElectrical resistivity and conductivityThin filmNitrideLayer (electronics)Substrate (aquarium)NitrogenComposite materialNanotechnologyMetallurgyChemistryPhysicsOceanographyGeologyOrganic chemistryElectrical engineeringQuantum mechanicsEngineeringMetal and Thin Film MechanicsSemiconductor materials and devicesCopper Interconnects and Reliability