Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS
Albert Santoso, Afke Damen, J. Ruud van Ommen, Volkert van Steijn
Abstract
We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS.
Topics & Concepts
PolydimethylsiloxaneAtomic layer depositionLayer (electronics)SolventCoatingDeposition (geology)Materials scienceAtmospheric pressurePolymerChemical engineeringOxideOrganic solventTitaniumComposite materialChemistryOrganic chemistryMetallurgyOceanographyGeologyPaleontologyBiologyEngineeringSedimentSemiconductor materials and devicesDiamond and Carbon-based Materials ResearchAnalytical Chemistry and Sensors