SiC/SiO2 interface properties formed by low-temperature ozone re-oxidation annealing
Zhipeng Yin, Shengsheng Wei, Jiao Bai, Weiwei Xie, Fuwen Qin, Dejun Wang
Topics & Concepts
Materials scienceOzoneAnnealing (glass)Interface (matter)Engineering physicsChemical engineeringComposite materialMeteorologyCapillary numberEngineeringCapillary actionPhysicsSilicon Carbide Semiconductor TechnologiesSemiconductor materials and devicesAdvanced ceramic materials synthesis