Boron carbide thin films deposited by RF-PECVD and PLD technique: A comparative study based on structure, optical properties, and residual stress
A. Bute, S. Jena, Sunita Kedia, D. V. Udupa, Kulwant Singh, D. Bhattacharya, Mohammed H. Modi, Navin Chand, Sucharita Sinha
Topics & Concepts
Plasma-enhanced chemical vapor depositionMaterials scienceCrystallinityThin filmResidual stressPulsed laser depositionChemical vapor depositionComposite materialAmorphous solidAnalytical Chemistry (journal)NanotechnologyCrystallographyChemistryChromatographyDiamond and Carbon-based Materials ResearchMetal and Thin Film MechanicsBoron and Carbon Nanomaterials Research