Characterization of gliding arc discharge using H2/Ar gas mixture
Jeongan Choi, Seongil Choi, Young‐Hoon Song, Dae Hoon Lee
Abstract
Heat source electrification is an important challenge for mitigating global warming, and plasma is a promising candidate as a heat source for chemical processes. Given the need for effective heat transfer and the suppression of solid carbon production during plasma-driven chemical conversion processes, hydrogen plasma has gained considerable attention. In this study, we leveraged the characteristics of a H 2 /Ar mixture discharge to generate plasma for potential application in hydrocarbon pyrolysis and organic waste recycling. Hydrogen possesses unique properties such as low density and high mass diffusivity, and behaves differently in plasma compared with typical inert gases. The discharge of the H 2 /Ar gas mixture was characterized using optical diagnostics, including optical emission spectroscopy and high-speed imaging, with electrical parameters synchronized to the imaging setup. The results indicate a close relationship between hydrogen concentration and the excited hydrogen atom population. Arc Stability and excitation mechanisms are crucial for the utilization of H 2 /Ar plasma in chemical reactions. In the 20–80% hydrogen concentration range, excited hydrogen atoms were most abundant at a 20% H 2 concentration. These findings offer valuable insights into the use of H 2 /Ar plasma in chemical processes, underscoring the pivotal role of hydrogen concentration in excitation dynamics and plasma stability. The characteristics and arc behavior of H 2 /Ar plasma were investigated for applications in pyrolysis and organic waste recycling. Hydrogen concentration is a key parameter for controlling arc stability and the excitation levels of hydrogen atoms. • H 2 /Ar mixture discharge was employed in a 2D gliding arc reactor. • Electrical characteristics and arc behavior of H2/Ar arc plasma were studied using high-speed imaging and optical diagnostics. • This study offers valuable insights for using H 2 /Ar plasma in chemical processes.