CHARACTERIZATION OF SILVER CONTENT UPON PROPERTIES OF NANOSTRUCTURED NICKEL OXIDE THIN FILMS
H. T. SALLOOM, Esraa H. Hadi, Nadir Fadhil Habubi, Sami Salman Chiad, M. Jadan, Jihad S. Addasi
Abstract
The influence of two silver contents (2% and 4%) on NiO films were studied in terms of structural and optical properties. Ag doped NiO films were grown on glass and n-type silicon substrates heated at 400C by chemical pyrolysis method. Optical transmission measurements showed up to 60% transparency in the visible area for undoped NiO and decreased with increasing Ag content. X-ray diffraction assures the existence of epitaxial growth with the c-axis. Average particle size, surface roughness and energy gap were decreased also. Rectifying characteristics of junctions deposited films on n-type silicon has been analyzed. Transparent conductive films showed excellent properties to be adopted for solar cells and optical sensors.