Role of energetic ions in the growth of fcc and ω crystalline phases in Ti films deposited by HiPIMS
D. Dellasega, Francesco Mirani, D. Vavassori, Claudia Conti, M. Passoni
Topics & Concepts
High-power impulse magnetron sputteringMaterials scienceNucleationMicrostructureResidual stressSputter depositionTitaniumUltimate tensile strengthComposite materialSputteringIonAnalytical Chemistry (journal)Phase (matter)Thin filmMetallurgyNanotechnologyChemistryOrganic chemistryChromatographyMetal and Thin Film MechanicsDiamond and Carbon-based Materials ResearchIon-surface interactions and analysis