A novel dual-tone molecular glass resist based on adamantane derivatives for electron beam lithography
Shengwen Hu, Jinping Chen, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Guoqiang Yang, Yi Li
Abstract
A novel dual-tone molecular glass (AD-10Boc) resist was developed for electron beam lithography. The AD-10Boc resist can resolve dense line patterns of 21 nm and 30 nm L/S for negative-tone and positive-tone development, respectively.
Topics & Concepts
ResistElectron-beam lithographyMaterials scienceTone (literature)LithographyAdamantaneCathode rayBeam (structure)ElectronNanotechnologyOptoelectronicsOpticsPhysicsChemistryArtQuantum mechanicsLayer (electronics)LiteratureOrganic chemistryAdvancements in Photolithography TechniquesNanofabrication and Lithography TechniquesSemiconductor materials and devices