Improvement of polishing performance of SiO2/Si3N4 by surfactants in CeO2 based slurry
Xinyu Zhao, Xinyu Han, Fangyuan Wang, Baimei Tan, Yunhui Shi, Jiadong Zhao, Wenyue Qi, Jiaji Geng
Topics & Concepts
PolishingSlurryMaterials scienceChemical-mechanical planarizationChemical engineeringMetallurgyComposite materialEngineeringAdvanced Surface Polishing TechniquesAdvanced ceramic materials synthesisMineral Processing and Grinding