Experimental and theoretical computational study of corrosion inhibitors in the cobalt bulk chemical mechanical polishing (CMP) process
Qinhua Miao, Lei Fan, Fan Zhang, Yaran Lv, Jie Cheng
Topics & Concepts
Chemical-mechanical planarizationCobaltPolishingCorrosionMaterials scienceProcess (computing)MetallurgyComputer scienceOperating systemAdvanced Surface Polishing TechniquesAdvanced materials and compositesAdvanced machining processes and optimization