Effect of nitrogen partial pressure on the TCR of magnetron sputtered indium tin oxide thin films at high temperatures
Zhichun Liu, Junsheng Liang, Hao Zhou, Jian Li, Mingjie Yang, Sen Cao, Jun Xu
Topics & Concepts
Materials scienceIndium tin oxideThin filmScanning electron microscopeGrain sizeCrystallinityAnalytical Chemistry (journal)Partial pressureSputter depositionSputteringThermal stabilityCrystalliteOxideTemperature coefficientIndiumComposite materialOxygenMetallurgyChemical engineeringNanotechnologyChemistryChromatographyEngineeringOrganic chemistryAdvanced Sensor Technologies ResearchElectrical and Thermal Properties of MaterialsSensor Technology and Measurement Systems