Design and Optimization of Dual Material Gate Junctionless FinFET Using Dimensional Effect, Gate Oxide and Workfunction Engineering at 7 nm Technology Node
Rambabu Kusuma, V. K. Hanumantha Rao Talari
Topics & Concepts
Materials scienceGate oxideOxideOptoelectronicsHigh-κ dielectricIonEquivalent oxide thicknessGate dielectricNanoscopic scaleDrain-induced barrier loweringDielectricDopingNanotechnologyElectrical engineeringTransistorVoltagePhysicsMetallurgyEngineeringQuantum mechanicsSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignIntegrated Circuits and Semiconductor Failure Analysis