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Ultrahigh Néel Temperature Antiferromagnetism and Ultrafast Laser-Controlled Demagnetization in a Dirac Nodal Line MoB<sub>3</sub> Monolayer

Zhen Gao, Fengxian Ma, Ziming Zhu, Qin Zhang, Ying Liu, Yalong Jiao, Aijun Du

2024Nano Letters22 citationsDOIOpen Access PDF

Abstract

High Resolution Image Download MS PowerPoint Slide Two-dimensional (2D) antiferromagnetic (AFM) materials boasting a high Néel temperature ( T N ), high carrier mobility, and fast spin response under an external field are in great demand for efficient spintronics. Herein, we theoretically present the MoB 3 monolayer as an ideal 2D platform for AFM spintronics. The AFM MoB 3 monolayer features a symmetry-protected, 4-fold degenerate Dirac nodal line (DNL) at the Fermi level. It demonstrates a high magnetic anisotropy energy of 865 μeV/Mo and an ultrahigh T N of 1050 K, one of the highest recorded for 2D AFMs. Importantly, we reveal the ultrafast demagnetization of AFM MoB 3 under laser irradiation, which induces a rapid transition from a DNL semimetallic state to a metallic state on the time scale of hundreds of femtoseconds. This work presents an effective method for designing advanced spintronics using 2D high-temperature DNL semimetals and opens up a new idea for ultrafast modulation of magnetization in topological semimetals.

Topics & Concepts

AntiferromagnetismMonolayerCondensed matter physicsDirac (video compression format)Ultrashort pulseLine (geometry)Materials scienceLaserPhysicsOpticsNanotechnologyQuantum mechanicsNeutrinoGeometryMathematics2D Materials and ApplicationsTopological Materials and PhenomenaGraphene research and applications
Ultrahigh Néel Temperature Antiferromagnetism and Ultrafast Laser-Controlled Demagnetization in a Dirac Nodal Line MoB<sub>3</sub> Monolayer | Litcius