Material manufacturing from atomic layer
Xinwei Wang, Rong Chen, Shuhui Sun
Abstract
Highlights Atomic layer deposition (ALD) can offer many unique properties to achieve atomic-scale material manufacturing controllability. The need of ALD for accurate material manufacturing is addressed. The keys to achieve good ALD are summarized. The status quo and future challenges of the ALD technology are presented.
Topics & Concepts
Atomic layer depositionAtomic unitsControllabilityStatus quoNanotechnologyLayer (electronics)Materials scienceComputer sciencePhysicsMathematicsMarket economyEconomicsApplied mathematicsQuantum mechanicsSemiconductor materials and devicesElectronic and Structural Properties of OxidesAdvanced Memory and Neural Computing