Organosilicon films deposited in low-pressure plasma from hexamethyldisiloxane — A review
Amanda S. M. de Freitas, Cristiane C. Maciel, Jéssica S. Rodrigues, Rafael Parra Ribeiro, Adriana de Oliveira Delgado-Silva, Elidiane Cipriano Rangel
Topics & Concepts
HexamethyldisiloxaneOrganosiliconPlasma-enhanced chemical vapor depositionThin filmMaterials scienceDeposition (geology)Plasma polymerizationPlasma activationChemical engineeringVapor pressureChemical vapor depositionPlasmaNanotechnologyChemistryComposite materialOrganic chemistryPolymerPolymer chemistryPolymerizationBiologySedimentEngineeringPhysicsPaleontologyQuantum mechanicsSurface Modification and SuperhydrophobicityDiamond and Carbon-based Materials ResearchPlasma Applications and Diagnostics