Atomic layer deposition of oxide semiconductor thin films for transistor applications: a review
Inhong Hwang, Minki Choe, Dahui Jeon, In-Hwan Baek
Abstract
Silicon transistor miniaturization has hit a limit, constraining further semiconductor advancements. ALD-derived oxide semiconductors enable 3D vertical integration, providing a route to higher integration density without continued scaling down.
Topics & Concepts
Materials scienceAtomic layer depositionLayer (electronics)SemiconductorTransistorOptoelectronicsDeposition (geology)Thin-film transistorOxideThin filmAtomic layer epitaxyNanotechnologyEngineering physicsMetallurgyElectrical engineeringEngineeringSedimentPaleontologyVoltageBiologySemiconductor materials and devicesThin-Film Transistor TechnologiesElectronic and Structural Properties of Oxides