Impact of oxygen content on phase constitution and ferroelectric behavior of hafnium oxide thin films deposited by reactive high-power impulse magnetron sputtering
Samantha T. Jaszewski, Eric R. Hoglund, Anna Costine, Marc H. Weber, Shelby S. Fields, Maria Gabriela Sales, Jaykumar Vaidya, Leah Bellcase, Katie Loughlin, Alejandro Salanova, Diane A. Dickie, Steven L. Wolfley, Michael David Henry, Jon‐Paul Maria, Jacob L. Jones, Nikhil Shukla, Stephen McDonnell, Petra Reinke, Patrick E. Hopkins, James M. Howe, Jon F. Ihlefeld
Topics & Concepts
High-power impulse magnetron sputteringMaterials scienceHafniumSputteringThin filmImpulse (physics)Sputter depositionFerroelectricityOxygenOxideOptoelectronicsMetallurgyZirconiumNanotechnologyDielectricChemistryQuantum mechanicsPhysicsOrganic chemistryFerroelectric and Negative Capacitance DevicesSemiconductor materials and devicesMXene and MAX Phase Materials