Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films
Ivan Zyulkov, Viraj Madhiwala, Е. Н. Воронина, Matthew Snelgrove, J. Bogan, Robert O’Connor, Stefan De Gendt, Silvia Armini
Abstract
/Cu lines.
Topics & Concepts
PassivationMaterials scienceAtomic layer depositionX-ray photoelectron spectroscopySilaneDiethylenetriamineSiloxaneChemical engineeringNanotechnologySiliconDeposition (geology)WaferLayer (electronics)Surface modificationOptoelectronicsPolymerComposite materialEngineeringPaleontologyBiologySedimentSemiconductor materials and devicesCopper Interconnects and ReliabilityMolecular Junctions and Nanostructures