Design of a K-Band High-Linearity Asymmetric SPDT CMOS Switch Using a Stacked Transistor
Taehun Kim, Hui Dong Lee, Bonghyuk Park, Seunghyun Jang, Sunwoo Kong, Changkun Park
Abstract
This study presents a high-linearity K - band single-pole double-throw (SPDT) switch with asymmetric topology in a 65-nm CMOS process for 5G applications. To simultaneously obtain high power-handling capability and high isolation in the Tx and Rx modes, respectively, we propose an SPDT switch using asymmetric topology and the stacked-transistor technique. In both the Tx/Rx modes, the proposed SPDT switch operates with an insertion loss of less than 2.1 dB and isolation better than 22.5 dB in the frequency range 20–25 GHz. At 22 GHz, the measurement results of the input 1-dB compression point (IP1 dB) are 32.5 and 4.7 dBm in Tx and Rx modes, respectively. The chip core size of the proposed SPDT switch is 0.03 mm2.