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The influence of NH3 flow rate on the microstructure and oxidation properties of a-Si-C-N:H films prepared by PECVD technology

Lihua Jiang, Haiyan Tian, Jie Li, Peng Xiang, Yu Peng, Tao Wang, Pingping Hou, Ting Xiao, Xinyu Tan

2020Applied Surface Science11 citationsDOI

Topics & Concepts

MicrostructurePlasma-enhanced chemical vapor depositionMaterials scienceChemical engineeringNanotechnologyMetallurgyThin filmEngineeringSemiconductor materials and devicesDiamond and Carbon-based Materials ResearchMetal and Thin Film Mechanics
The influence of NH3 flow rate on the microstructure and oxidation properties of a-Si-C-N:H films prepared by PECVD technology | Litcius