Litcius/Paper detail

Bottom-up Cu filling of annular through silicon vias: Microstructure and texture

Sang‐Hyeok Kim, Hyo‐Jong Lee, D. Josell, Thomas P. Moffat

2020Electrochimica Acta32 citationsDOIOpen Access PDF

Topics & Concepts

MicrostructureTexture (cosmology)Materials scienceSiliconComposite materialMetallurgyComputer scienceArtificial intelligenceImage (mathematics)Electrodeposition and Electroless CoatingsCopper Interconnects and ReliabilitySemiconductor materials and interfaces
Bottom-up Cu filling of annular through silicon vias: Microstructure and texture | Litcius