Effect of target power ratio on microstructure and deposition rate of TiN film deposited by dual pulse power magnetron sputtering
Chao Yang, Rong Wang, Bailing Jiang, Juan Hao
Topics & Concepts
Materials scienceTinMicrostructureSputter depositionSputteringDeposition (geology)EvaporationHigh-power impulse magnetron sputteringMetallurgyCavity magnetronAnalytical Chemistry (journal)Thin filmComposite materialNanotechnologyChromatographySedimentPaleontologyChemistryPhysicsBiologyThermodynamicsMetal and Thin Film MechanicsGaN-based semiconductor devices and materialsCopper Interconnects and Reliability