Characterization of AlN and AlScN film ICP etching for micro/nano fabrication
Zhifang Luo, Shuai Shao, Tao Wu
Topics & Concepts
Materials sciencePhotoresistEtching (microfabrication)NitrideFabricationOptoelectronicsInductively coupled plasmaThin filmDry etchingReactive-ion etchingPlasma etchingLayer (electronics)PlasmaNanotechnologyAlternative medicineMedicinePathologyPhysicsQuantum mechanicsAcoustic Wave Resonator TechnologiesAdvanced MEMS and NEMS TechnologiesGaN-based semiconductor devices and materials