Atomic layer deposited boron nitride nanoscale films act as high temperature hydrogen barriers
Sarah K. Bull, Theodore A. Champ, S. V. Raj, Robert C. O’Brien, Charles B. Musgrave, Alan W. Weimer
Topics & Concepts
HydrogenMaterials scienceAtomic layer depositionDiffusion barrierActivation energyNuclear reaction analysisBoron nitrideThin filmChemical engineeringChemical physicsAnalytical Chemistry (journal)NanotechnologyLayer (electronics)ChemistryPhysical chemistryOrganic chemistryEngineeringSemiconductor materials and devicesCatalytic Processes in Materials ScienceBoron and Carbon Nanomaterials Research