Influence of high dielectric HfO2 thin films on the electrical properties of Al/HfO2/n-Si (MIS) structured Schottky barrier diodes
P. Harishsenthil, J. Chandrasekaran, R. Marnadu, P. Balraju, C. Mahendran
Topics & Concepts
Materials scienceSchottky barrierDielectricSubstrate (aquarium)Amorphous solidDiodeSchottky diodeOptoelectronicsMonoclinic crystal systemBand gapThin filmSemiconductorBarrier layerLayer (electronics)Phase (matter)NanotechnologyCrystallographyCrystal structureGeologyOceanographyOrganic chemistryChemistrySemiconductor materials and devicesSemiconductor materials and interfacesIntegrated Circuits and Semiconductor Failure Analysis