Effects of HfO2 addition on the plasma resistance of Y2O3 thin films deposited by e-beam PVD
Kang-Bin Bae, Hae-Seong Jang, Yoon-Suk Oh, In-Hwan Lee, Sung‐Min Lee
Topics & Concepts
X-ray photoelectron spectroscopyMaterials scienceSputteringThin filmCeramicEtching (microfabrication)SemiconductorPhysical vapor depositionPlasmaChemical vapor depositionDeposition (geology)Analytical Chemistry (journal)Composite materialChemical engineeringNanotechnologyOptoelectronicsLayer (electronics)ChemistryEngineeringPhysicsChromatographyPaleontologyQuantum mechanicsSedimentBiologySemiconductor materials and devicesZnO doping and propertiesGa2O3 and related materials