Development of Highly stable ceria slurry in acetic acid-ammonium acetate buffer Media for effective chemical mechanical polishing of silicon dioxide
Min Liu, Baoguo Zhang, Jihoon Seo, Wenhao Xian, Dexing Cui, Shitong Liu, Yijun Wang, Sihui Qin, Yang Liu
Topics & Concepts
Materials scienceAcetic acidSlurrySilicon dioxideAmmonium acetatePolishingChemical-mechanical planarizationBuffer (optical fiber)Chemical engineeringSiliconAmmoniumComposite materialMetallurgyOrganic chemistryChemistryHigh-performance liquid chromatographyEngineeringTelecommunicationsComputer scienceAdvanced Surface Polishing TechniquesAdvanced ceramic materials synthesisAdvanced materials and composites