Non-contact Post-CMP megasonic cleaning of cobalt wafers
Lifei Zhang, Xinchun Lu, Ahmed Busnaina
Topics & Concepts
Chemical-mechanical planarizationMaterials scienceWaferLayer (electronics)NanoparticleCobaltChemical engineeringVolumetric flow rateAdsorptionWet cleaningNanotechnologyDiffusionOptoelectronicsComposite materialMetallurgyChemistryOrganic chemistryThermodynamicsPhysicsEngineeringQuantum mechanicsAdvanced Surface Polishing TechniquesAdvanced Machining and Optimization TechniquesMicrofluidic and Bio-sensing Technologies