Physiochemical etching characteristics and surface analysis of Y2O3-MgO nanocomposite under different CF4/Ar/O2 plasma atmospheres
Ho Jin, Young‐Jo Park, Mi‐Ju Kim, Ha‐Neul Kim, Jae‐Woong Ko, Jae‐Wook Lee, Jung‐Hyung Kim, Hyo‐Chang Lee
Topics & Concepts
Materials scienceNanocompositeSputteringCeramicEtching (microfabrication)Plasma etchingPlasmaWaferSurface roughnessReactive-ion etchingIsotropic etchingChemical engineeringNanotechnologyComposite materialThin filmLayer (electronics)PhysicsEngineeringQuantum mechanicsPlasma Diagnostics and ApplicationsZnO doping and propertiesMetal and Thin Film Mechanics