Litcius/Paper detail

Effects of aging time in hydrogen peroxide-glycine-based Cu CMP slurry

Juhwan Kim, Donggeon Kwak, Jungjae Park, Takayuki Kubota, Taesung Kim

2021Materials Science in Semiconductor Processing20 citationsDOI

Topics & Concepts

Hydrogen peroxideOxidizing agentSlurryDecompositionChemical-mechanical planarizationMaterials scienceInorganic chemistryMetalPeroxideOxygenChemistryChemical engineeringOrganic chemistryMetallurgyComposite materialPolishingEngineeringAdvanced Surface Polishing TechniquesAdvanced machining processes and optimizationAdvanced Machining and Optimization Techniques